1t-1r architecture for resistive random access memory

ABSTRACT

A memory device includes an array of resistive memory cells wherein each pair of resistive memory cells includes a first switching element electrically coupled in series to a first resistive memory element and a second switching element electrically coupled in series to a second resistive memory element. A source of the first switching element and a source of the second switching element receive a common source line signal.

RELATED APPLICATIONS

The present disclosure is a continuation of U.S. application Ser. No.14/567,988, filed Dec. 22, 2014, titled “1T-1R ARCHITECTURE FORRESISTIVE RANDOM ACCESS MEMORY”, which claims priority to U.S.provisional application 62/050,326, filed Sep. 15, 2014, titled “CIRCUITAND ARCHITECTURE SOLUTIONS FOR A 1TRANSISTOR-1RESISTOR CELL RRAM,” whichis incorporated herein by reference in its entirety.

TECHNICAL FIELD

The present disclosure relates to semiconductor memory and, moreparticularly, to resistive random access memory (RRAM) with a onetransistor, one resistive element (1T-1R) memory cell architecture.

BACKGROUND

Non-volatile memory devices that retain stored data in the absence ofpower are pervasively used in consumer electronic products includingcell phones, tablets, personal computers, personal digital assistants,and the like. Unfortunately, many non-volatile memory devices havelimitations that make them unsuitable for use as primary storage forthese products including higher cost and lower performance when comparedto volatile memory devices such as dynamic random access memory (DRAM).Examples of older technology non-volatile memory devices includeread-only memory (ROM) and flash memory. Examples of newer technologynon-volatile memory devices include resistive random access memory(RRAM), phase change memory (PCM), spin-transfer torque magnetoresistive random access memory (STT-MRAM), ferroelectric random accessmemory (FRAM), and many others.

RRAM operates on the basis that a typically insulating dielectric may bemade to conduct through formation of a conduction path or filament uponapplication of a sufficiently high voltage. Formation of the conductionpath may occur through different mechanisms, including defects and metalmigration. Once the conduction path or filament forms, the filament maybe reset (broken, resulting in high resistance) or set (reformed,resulting in lower resistance) by an appropriately applied voltage.Recent data suggests that the conduction path may include manyconduction paths, rather than a single path through a single filament.RRAM devices including conductive bridge RAM (CBRAM) and transitionmetal oxide RRAM are a focal point for current development. In CBRAMdevices, metal filaments between two electrodes form the conductionpath, where one of the electrodes participates in the reaction. Intransition metal oxide RRAM, oxygen vacancy filaments in a transitionmetal such as hafnium oxide or tantalum oxide form the conduction path.

RRAM devices used in consumer and communication applications may berequired to retain data for 10 years at 85 degrees. In contrast, RRAMdevices used in industrial and automotive applications may be requiredto retain data for 10 years at 125°. Further, RRAM devices used inconsumer and communication applications often do not have the speed andprocessing requirements of RRAM devices used in industrial andautomotive applications, which allows for simpler cell architecturescapable of manufacture using conventional processing technologies. Assuch, RRAM devices with 1T-1R memory cell architectures may beattractive for use in consumer and communication applications.

BRIEF DRAWINGS DESCRIPTION

The present disclosure describes various embodiments that may beunderstood and fully appreciated in conjunction with the followingdrawings:

FIG. 1 is a diagram of an embodiment of a 1T-1R memory cell;

FIG. 2 is a diagram of an embodiment of a portion of a 1T-1R memoryarray;

FIG. 3A is a diagram illustrating punch-through in a portion of a 1T-1Rmemory array;

FIG. 3B is a diagram illustrating an embodiment of a method of operatinga portion of a 1T-1R memory array to address punch-through;

FIG. 4 is a diagram of an embodiment of a portion of a 1T-1T memoryarray;

FIG. 5A are diagrams illustrating an embodiment of a method of biasingthe portion of a 1T-1R memory array shown in FIG. 2 during form, set,reset, and read operations;

FIG. 5B are diagrams illustrating an embodiment of a method of biasingthe portion of a 1T-1R memory array shown in FIG. 4 during form, set,reset, and read operations;

FIG. 6A is a diagram illustrating address mapping for an embodiment of a1T-1R memory array;

FIG. 6B is a timing diagram of signals used to write data to the 1T-1Rmemory array shown in FIG. 6A;

FIG. 7A is a diagram illustrating address mapping for an embodiment of a1T-1R memory array;

FIG. 7B is a timing diagram of signals used to write data to the 1T-1Rmemory array shown in FIG. 7A;

FIG. 8A is a diagram of an embodiment of a voltage signal sequenceapplied to a portion of a 1T-1R memory array during a form operation;

FIG. 8B is a timing diagram of an embodiment of the voltage signalsequence applied to the portion of the 1T-1R memory array shown in FIG.8A during the form operation;

FIG. 9A is a diagram of an embodiment of a voltage signal sequenceapplied to a portion of a 1T-1R memory array during a set operation;

FIG. 9B is a timing diagram of an embodiment of the voltage signalsequence applied to the portion of the 1T-1R memory array shown in FIG.9A during the set operation;

FIG. 10A is a diagram of an embodiment of a voltage signal sequenceapplied to a portion of a 1T-1R memory array during a reset operation;

FIG. 10B is a timing diagram of an embodiment of the voltage signalsequence applied to the portion of the 1T-1R memory array shown in FIG.10A during the reset operation;

FIG. 11A is a diagram of an embodiment of a voltage signal sequenceapplied to a portion of a 1T-1R memory array during a read operation;

FIG. 11B is a timing diagram of an embodiment of the voltage signalsequence applied to the portion of the 1T-1R memory array shown in FIG.10A during the read operation; and

FIG. 12 is a diagram of an embodiment of a 1T-1R memory array includingan embodiment of current limiting selector circuit.

DETAILED DESCRIPTION

The present disclosure describes embodiments with reference to thedrawing figures listed above. Persons of ordinary skill in the art willappreciate that the description and figures illustrate rather than limitthe disclosure and that, in general, the figures are not drawn to scalefor clarity of presentation. Such skilled persons will also realize thatmany more embodiments are possible by applying the inventive principlescontained herein and that such embodiments fall within the scope of thedisclosure which is not to be limited except by the claims.

Referring to FIG. 1, a 1T-1R memory cell 100 includes a memory element101 electrically coupled in series to a select transistor 102 at a firstend and coupled to a bit line terminal receiving a bit line signal BL ata second end. Select transistor 102 receives a word line signal WL at agate and a source line signal SL at a source. Memory cell 100 mayoperate in response to bit line signal BL, word line signal WL, andsource line signal SL.

Memory element 101 may include any kind of memory technology known to aperson of ordinary skill in the art that changes resistance as afunction of applied voltage or current, e.g., Resistive Random AccessMemory (RRAM), Phase Change Memory (PCM), Spin-Transfer Torque MagneticRandom Access Memory (STT-MRAM), and the like.

FIG. 2 is a diagram of a portion of a 1T-1R memory array 200 including aplurality of memory cells, e.g., cells 201, 202, 203, and 204, arrangedin a plurality of columns extending in a first direction and a pluralityof rows extending in a second direction typically perpendicular to thefirst direction. Memory cells 201, 202, 203, and 204 may have aconstruction similar to that of memory cell 100 shown in FIG. 1. As withmemory cell 100, each of memory cells 201, 202, 203, and 204 is coupledto receive a bit line signal, e.g., BL0 or BL1, word line signal, e.g.,WL0 or WL1, and source line signal, e.g., SL0 or SL1. Memory cells 201,202, 203, and 204 may include any type of memory technology known to aperson of ordinary skill in the art that changes resistance as afunction of applied voltage or current, e.g., RRAM, PCM, STT-MRAM, andthe like.

In an embodiment of array 200, a column of memory cells is coupled toreceive a common bit line signal while a row of memory cells is coupledto receive a common word line signal and a common source line signal.For example, memory cells 201 and 203 arranged on a first columncommonly receive a first bit line signal BL0 while memory cells 202 and204 arranged on a second column commonly receive a second bit linesignal BL1. Memory cells 201 and 202 arranged on a first row commonlyreceive a first word line signal WL1 at corresponding gates and receivea first source line signal SL1 at corresponding sources. Likewise,memory cells 203 and 204 arranged on a second row commonly receive asecond word line signal WL0 at corresponding gates and receive a secondsource line signal SL0 at corresponding sources.

In an embodiment, a control circuit 210 may generate voltage signalsnecessary to operate memory array 200 including bit line signals BL0 orBL1, word line signals WL0 or WL1, and source line signals SL0 or SL1 asis well known to a person of ordinary skill in the art. In anembodiment, control circuit 210 avoids voltage or high current stresseson the memory cells, e.g., memory cells 201, 202, 203, and 204 thatwould result in damage, wear out, reduced life, or the like, by applyingthe necessary voltage signals in predetermined levels and/or in apredetermined sequence as further described below.

FIG. 3A is a diagram illustrating punch-through in a portion of a 1T-1Rmemory array 300A. Punch-though refers to a situation in which thedepletion layers around the drain and source regions of a transistor,e.g., select transistor T2A of memory cell 302A, merge into a singledepletion region due to voltage overstress. The field underneath thegate of select transistor T2A then becomes strongly dependent on thedrain-source voltage, as is the drain current. Punch through may cause arapidly increasing current with increasing drain-source voltage, aneffect that is undesirable as it may degrade the reliability of memoryarray 300A, may increase power requirements due to leakage currents inunselected cells, and may necessitate larger select transistors to avoidthe problem among other undesirable issues.

Memory array 300A has all of its unselected source lines, e.g., SL1,biased at ground during a form operation. During the form operation ofselected cell 304A, a voltage often greater than 3.5V may be applied tothe selected bit line signal BL0, which, in turn, may causepunch-through for unselected cells, e.g., memory cell 302A, coupled tobit line signal BL0 since the voltage across the source and drain regionis high at 3.5V.

FIG. 3B is a diagram illustrating an embodiment of a method of operatinga portion of a 1T-1R memory array 300B to avoid the undesirablepunch-through failure shown in FIG. 3A. An exemplary bias scheme inwhich a memory cell 304B is selected for a form operation is shown inTable 1.

TABLE 1 Form Operation Selected bit line signal BL0 3.5 V Selectedsource line signal SL0   0 V Selected word line signal WL0 1.5 VUnselected bit line signal BL1   0 V Unselected source line signal SL1  2 V Unselected word line signal WL1   0 V

Punch-through of select transistor T2B of unselected memory cell 302B isavoided by biasing unselected source lines, e.g., SL1, at a voltage thatis higher than ground and less than the selected bit line signal voltageBL1 of 3.5V. For example, punch-though of select transistor T2B isavoided by biasing unselected source line signals SL1 at an intermediatevoltage of 2V. A person of skill in the art should recognize thatunselected source lines may be biased at many other voltages higher thanground and less than the selected bit line signal voltage depending onvarious design parameters associated with memory array 300B to avoidpunch-through of select transistors of unselected memory cells duringform operations of selected memory cells.

FIG. 4 is a diagram of an embodiment of a portion of a 1T-1R memoryarray 400 in which memory cells positioned on adjacent rows areelectrically coupled to a common source line. Memory array 400 mayinclude a plurality of memory cells, e.g., cells 401, 402, 403, 404,405, 406, 407, and 408, arranged in a plurality of columns extending ina first direction and a plurality of rows extending in a seconddirection perpendicular to the first direction. For example, memorycells 401 and 402 extend in a first row horizontally while memory cells401, 403, 405, and 407 extend in a first column vertically.

Memory cells 401, 402, 403, 404, 405, 406, 407, and 408 may have aconstruction similar to that of memory cell 100 shown in FIG. 1. As withmemory cell 100, each of memory cells 401, 402, 403, 404, 405, 406, 407,and 408 is coupled to receive a bit line signal, e.g., BL0 or BL1, aword line signal, e.g., WL0, WL1, WL2, or WL3, and a source line signal,e.g., SL0 or SL1. In an embodiment, a control circuit 410 may generatevoltage signals necessary to operate memory array 400 including bit linesignals BL0 and BL1, word line signals WL0, WL1, WL2, and WL3, andsource line signals SL0 and SL1, as is well known to a person ofordinary skill in the art. In an embodiment, control circuit 410 avoidsvoltage or high current stresses on the memory cells, e.g., memory cells401, 402, 403, 404, 405, 406, 407, and 408 that would result in damage,wear out, reduced life, or the like, by applying the necessary voltagesignals in predetermined levels and/or in a predetermined sequence asfurther described below.

In an embodiment of memory array 400, a column of memory cells iscoupled to receive a common bit line signal while a row of memory cellsis coupled to receive a common word line signal and a common source linesignal. For example, memory cells 401, 403, 405, and 407 arranged on afirst column may commonly receive a bit line signal BL1 while memorycells 402, 404, 406, and 408 arranged on a second column may commonlyreceive a bit line signal BL0. Memory cells 401 and 402 arranged on arow may commonly receive a word line signal WL3 at corresponding gateterminals and receive a source line signal SL1 at corresponding sourceterminals. Likewise, memory cells 403 and 404 arranged on a row maycommonly receive a word line signal WL2 at corresponding gate terminalsand receive source line signal SL1 at corresponding source terminals.Memory cells 405 and 406 arranged on a row may commonly receive a wordline signal WL1 at corresponding gate terminals and receive a sourceline signal SL0 at corresponding source terminals while memory cells 407and 408 arranged on a row may commonly receive a word line signal WL0 atcorresponding gate terminals and receive source line signal SL0 atcorresponding source terminals.

In an embodiment, memory cells positioned on adjacent rows of memoryarray 400 may be electrically coupled to receive a common source linesignal. For example, memory cells 401 and 402 positioned on a first rowand memory cells 403 and 404 positioned on a second row adjacent to thefirst row may be coupled to receive common source line signal SL1.Similarly, memory cells 405 and 406 positioned on a third row and memorycells 407 and 408 positioned on a fourth row adjacent to the third rowmay be coupled to receive common source line signal SL0. As with memorycell 100, memory cells 401, 402, 403, 404, 405, 406, 407, and 408 mayinclude any type of memory technology known to a person of ordinaryskill in the art that changes resistance as a function of appliedvoltage or current, e.g., RRAM, PCM, STT-MRAM, and the like. Significantcell size reductions of, e.g., 15-25% may result from memory array 400in which memory cells positioned on adjacent rows share source linesignals.

FIG. 5A are diagrams illustrating an embodiment of a method of operatingthe portion of memory array 200 shown in FIG. 2 during form, set, reset,and read operations to avoid punch-through or other undesirable effects.An exemplary bias scheme in which a memory cell 504 is selected for aform operation is shown in Table 1 above.

An exemplary bias scheme in which a memory cell 504 is selected for aset operation is shown in Table 2.

TABLE 2 Set Operation Selected bit line signal BL0   2 V Selected sourceline signal SL0   0 V Selected word line signal WL0 1.5 V Unselected bitline signal BL1   0 V Unselected source line signal SL1   1 V Unselectedword line signal WL1   0 V

An exemplary bias scheme in which a memory cell 504 is selected for areset operation is shown in Table 3.

TABLE 3 Reset Operation Selected bit line signal BL0   0 V Selectedsource line signal SL0 2.5 V Selected word line signal WL0   3 VUnselected bit line signal BL1 2.5 V Unselected source line signal SL11.5 V Unselected word line signal WL1   0 V

An exemplary bias scheme in which a memory cell 504 is selected for aread operation is shown in Table 4.

TABLE 4 Read Operation Selected bit line signal BL0 0.25 V Selectedsource line signal SL0   0 V Selected word line signal WL0   1 VUnselected bit line signal BL1   0 V Unselected source line signal SL1  0 V Unselected word line signal WL1   0 V

FIG. 5B are diagrams illustrating an embodiment of a method of biasingthe portion of memory array 400 shown in FIG. 4 during form, set, reset,and read operations to avoid punch-through or other undesirable effects.For any byte to be written, a control circuit (not shown) may perform aset operation on all the memory cells corresponding to an addressedbyte, and then only reset some of those memory cells (representing bits)based on the data to be written. Control circuit 410 may map addressesto allow a nearly simultaneous set and form operation performed on cellson adjacent rows.

An exemplary bias scheme in which memory cells 506 and 508 are selectedfor a form operation is shown in Table 5.

TABLE 5 Form Operation Selected bit line signal BL0 3.5 V Selectedsource line signal SL0   0 V Selected word line signal WL0, WL1 1.5 VUnselected bit line signal BL1   0 V Unselected source line signal SL1  2 V Unselected word line signals WL2, WL3   0 V

An exemplary bias scheme in which memory cells 506 and 508 are selectedfor a set operation is shown in Table 6.

TABLE 6 Set Operation Selected bit line signal BL0   2 V Selected sourceline signal SL0   0 V Selected word line signal WL0, WL1 1.5 VUnselected bit line signal BL1   0 V Unselected source line signal SL1  1 V Unselected word line signals WL2, WL3   0 V

An exemplary bias scheme in which a memory cell 506 is selected for areset operation is shown in Table 7.

TABLE 7 Reset Operation Selected bit line signal BL0   0 V Selectedsource line signal SL0 2.5 V Selected word line signal WL1   3 VUnselected bit line signal BL1 2.5 V Unselected source line signal SL1  1 V Unselected word line signals WL0, WL2, WL3   0 V

An exemplary bias scheme in which a memory cell 506 is selected for aread operation is shown in Table 8.

TABLE 8 Read Operation Selected bit line signal BL0 0.25 V Selectedsource line signal SL0   0 V Selected word line signal WL1   1 VUnselected bit line signal BL1   0 V Unselected source line signal SL1  0 V Unselected word line signals WL0, WL2, WL3   0 V

In an embodiment, control circuit 410 (FIG. 4) may map groups of memorycells in array 400 to address bytes as shown in FIGS. 6A and 6B. Controlcircuit 410 may map a group of eight memory cells corresponding to bitlines BL0 to BL7, word line signal WL0, and source line signal SL toaddress 0. Similarly, control circuit 410 may map a group of eightmemory cells corresponding to bit lines BL0 to BL7, word line signalWL1, and source line signal SL to address 1. In an embodiment shown inFIG. 6A, memory cells mapped to address 0 may be positioned on eightadjacent columns of a first row of memory array 400 and memory cellsmapped to address 1 may be positioned on the same eight adjacent columnsbut on a second row of memory array 400, where the first row is adjacentto the second row.

Referring to FIG. 6B, control circuit 410 may write data to memory cellsin address 1 or address 0 by first setting all the bits in address 0 andaddress 1 to a first value, e.g., 0. Thereafter, control circuit 410 mayreset bits in address 0 or address 1 to a second value, e.g., 1, basedon the data. In an embodiment, control circuit 410 may reset bits inaddress 1 sequentially after resetting bits in address 0 based on thedata.

In another embodiment, control circuit 410 (FIG. 4) may map groups ofmemory cells in array 400 to address bytes as shown in FIGS. 7A and 7B.Control circuit 410 may map a first group of eight memory cellscorresponding to first bit lines BLA0 to BLA3, word line signals WL01Aand WL01B, and source line signal SL to address 0 and control circuit410 may map a second group of eight memory cells corresponding to secondbit lines BLB0 to BLB3, word line signals WL01A and WL01B, and sourceline signal SL to address 1. In an embodiment shown in FIG. 7A, memorycells in the first group of eight memory cells mapped to address 0 maybe positioned on a first group of four adjacent columns on two adjacentrows and memory cells mapped to address 1 may be positioned on a secondgroup of four adjacent columns on the two adjacent rows. A bit lineregister and multiplexer 712 may multiplex bit lines BL0 to BL7 fromcontrol circuit 410 to generate bit line signals BLA0 to BLA3 or bitline signals BLB0 to BLB3 to select memory cells in address 0 or address1, respectively.

Referring to FIG. 7B, control circuit 410 may write data to memory cellsin address 0 by first setting all the bits in address 0 to a firstvalue, e.g., 0 and then resetting bits in address 0 to a second value,e.g., 1, based on the data. Note that control circuit 410 may firstreset bits in memory cells mapped to address 0 corresponding to bit linesignals BL[3:0] before resetting bits in memory cells corresponding tobit lines signals BL[7:4].

Similarly, control circuit 410 may write data to memory cells in address1 by first setting all the bits in address 1 to a first value, e.g., 0and then resetting bits in address 1 to a second value, e.g., 1, basedon the data. Control circuit 410 may first reset bits in memory cellsmapped to address 1 corresponding to bit line signals BL[3:0] beforeresetting bits in memory cells corresponding to bit lines signalsBL[7:4].

FIG. 8A is a diagram of an embodiment of a voltage signal sequenceapplied to a portion of a memory array during a form operation. FIG. 8Bis a timing diagram of an embodiment of the voltage signal sequenceapplied to the portion of the 1T-1R memory array shown in FIG. 8A duringthe form operation. A form operation is typically performed once on amemory cell during its manufacture. In an embodiment in which a formoperation is performed substantially simultaneously on selected memorycells 806 and 808, control circuit 410 (FIG. 4) may apply the sequenceof voltage signals as follows:

At step 1, charge unselected source line signal SL1 to an intermediatevoltage to avoid punch-through, e.g., to 2V (hold selected source linesignal SL0 at 0V).

At step 2, charge selected word line signals WL1 and WL0 to V_(MIRROR),e.g., to 0.75V (hold unselected word line signals WL2 and WL3 to 0V).V_(MIRROR) may be generated by a current control circuit included in acontrol circuit 410 (FIG. 4) to limit the current through the resistiveelement to avoid over programming and the local heating of such that candegrade long term reliability of the resistive element. FIG. 12 shows anexemplary current control circuit that is described in more detailbelow.

At step 3, charge selected bit line signal BL0 to V_(FORM), e.g., 3.5V(hold unselected bit line signal BL1 to 0V).

At step 4, hold voltages in steps 1 to 3 during a form operation for atime t_(FORM) for bit cells corresponding to selected word line signalsWL0 and WL1 and selected bit line signal BL0.

At step 5, discharge selected bit line signal BL0.

At step 6, discharge unselected source line signal SL1.

At step 7, discharge selected word line signals WL0 and WL1.

FIG. 9A is a diagram of an embodiment of a voltage signal sequenceapplied to a portion of a memory array during a set operation. FIG. 9Bis a timing diagram of an embodiment of the voltage signal sequenceapplied to the portion of the 1T-1R memory array shown in FIG. 9A duringthe set operation. In an embodiment in which a set operation isperformed substantially simultaneously on selected memory cells 906 and908, control circuit 410 (FIG. 4) may apply the sequence of voltagesignals as follows:

At step 1, charge unselected source line signals SL1 to V_(DD), e.g.,1.5V (hold selected source line signal SL0 to 0V).

At step 2, charge selected word line signals WL1 and WL0 to V_(MIRROR),e.g., to 0.75V (hold unselected word line signals WL2 and WL3 to 0V).

At step 3, charge selected bit line signal BL0 to V_(SET), e.g., 2V(hold unselected bit line signal BL1 to 0V).

At step 4, hold voltages in steps 1 to 3 during a set operation for atime t_(SET) for bit cells corresponding to selected word line signalsWL0 and WL1 and selected bit line signal BL0.

At step 5, discharge selected bit line signal BL0.

At step 6, discharge unselected source line signal SL0.

At step 7, discharge selected word line signals WL0 and WL1.

FIG. 10A is a diagram of an embodiment of a voltage signal sequenceapplied to a portion of a memory array during a reset operation. FIG.10B is a timing diagram of an embodiment of the voltage signal sequenceapplied to the portion of the 1T-1R memory array shown in FIG. 10Aduring the reset operation. In an embodiment in which a reset operationis performed substantially simultaneously on selected memory cell 1006,control circuit 410 (FIG. 4) may apply the sequence of voltage signalsas follows:

At step 1, charge all source line signals SL0 and SL1 to V_(DD), e.g.,1.5V.

At step 2, charge all bit line signals BL0 and BL1 to V_(DD), e.g.,1.5V.

At step 3, charge selected word line signal WL1 to V_(DD), e.g., 1.5V(hold unselected word line signals WL0, WL2, and WL3 to 0V).

At step 4, charge selected source line signal SL0 and bit line signalsBL0 and BL1 to 2.5V.

At step 5, charge selected word line signal WL1 to 3V.

At step 6, discharge selected bit line signal BL0 to 0V (this step marksthe start of the reset operation).

At step 7, hold voltages in steps 1 to 6 during a reset operation for atime t_(RESET) for bit cells corresponding to selected word line signalWL1 and selected bit line signal BL0.

At step 8, discharge selected source line signal SL0 and selected wordline signals WL1.

At step 9, discharge unselected bit line signal BL1.

At step 10, discharge unselected source line signal SL1.

FIG. 11A is a diagram of an embodiment of a voltage signal sequenceapplied to a portion of a memory array during a read operation. FIG. 11Bis a timing diagram of an embodiment of the voltage signal sequenceapplied to the portion of the 1T-1R memory array shown in FIG. 11Aduring the read operation. In an embodiment in which a read operation isperformed substantially simultaneously on selected memory cell 1106,control circuit 410 (FIG. 4) may apply the sequence of voltage signalsas follows:

At step 1, charge selected bit line signal BL0 to V_(BL), e.g., 0.25V(hold unselected bit line signal BL1 to 0V).

At step 2, charge selected word line signal WL1 to V_(DD), e.g., 1.5V(hold all unselected word line signals WL0, WL2, and WL3 to 0V).

At step 3, develop bit line signal during a read operation for a timet_(READ) for bit cell corresponding to selected word line signal WL1 andselected bit line signal BL0.

At step 4, discharge selected word line signal WL1.

At step 5, discharge selected bit line signal BL0.

FIG. 12 is a diagram of an embodiment of a 1T-1R memory array 1200including an embodiment of bit line current control circuit 1220. Memoryarray 1200 may similar to memory array 200 including a plurality ofcolumns extending in a first direction and a plurality of rows extendingin a second direction perpendicular to the first direction. In anembodiment of array 1200, a column of memory cells is coupled to receivea common bit line signal while a row of memory cells is coupled toreceive a common word line signal and a common source line signal asdescribed previously in relation to memory array 200. In an embodiment,bit lines in memory array 1200 may be coupled to a bit line controlcircuit 1220 configured to control current provided to the plurality ofresistive memory cells. Bit line control circuit 1220 may includetransistors T2, T3, and T4 configured to form a current mirror withselected memory cells. In this configuration, the specific voltage thatwill appear on the bit line may vary as a function of the voltagethreshold of the select transistor in selected memory cell 1206. If thevoltage threshold is low, the bit line may rise (charged by the cellcurrent) until the normalized saturation drain current of the selecttransistor T1 matches the saturation drain current of the bit linetransistor T2. According, the variation of a threshold voltage of thecell select transistor T1 (in an advanced Complementary Metal OxideSemiconductor (CMOS) process where the variation in transistor thresholdvoltage from device to device can be relatively large, for example150-200 mV) may be addressed by the self-compensating effect of thecurrent mirror configuration between the select transistor T1 andtransistors T2, T3, and T4.

During a form or set operation, transistor T2 may limit the currentflowing through selected memory cell 1206 to lower variability andimprove bit yield and power consumption. Mismatch issues are avoidedsince driver transistors T2, T3, and T4 are typically larger in areathan the select transistor T1 included in memory cell 1206. In anembodiment, transistors T2, T3, and T4 may be Metal Oxide Semiconductor(MOS) transistors.

It will also be appreciated by persons of ordinary skill in the art thatthe present disclosure is not limited to what has been particularlyshown and described hereinabove. Rather, the scope of the presentdisclosure includes both combinations and sub-combinations of thevarious features described hereinabove as well as modifications andvariations which would occur to such skilled persons upon reading theforegoing description. Thus the disclosure is limited only by theappended claims.

1. (canceled)
 2. A memory device comprising: an array of memory cellsarranged in a plurality of columns in a first direction and a pluralityof rows in a second direction, wherein each memory cell in the arraycomprises: a select transistor, wherein a source terminal of the selecttransistor is coupled to a source line, and wherein a gate terminal ofthe select transistor is coupled to a word line; and a memory elementcoupled in series with the select transistor, wherein a first end of thememory element is coupled to a drain terminal of the select transistor,and wherein a second end of the memory element is coupled to a bit line.3. The memory device of claim 2, wherein each memory cell in one of theplurality of columns shares a first common bit line and wherein eachmemory cell in one of the plurality of rows shares a first common wordline and first common source line.
 4. The memory device of claim 2,wherein memory cells positioned on adjacent rows of the array areelectrically coupled to receive a common source line signal.
 5. Thememory device of claim 2, further comprising: a control circuit togenerate source line signals, word line signals and bit line signals tocontrol operation of the memory array.
 6. The memory device of claim 5,wherein the control circuit to apply a selected source line voltage to aselected source line corresponding to a selected memory cell of thearray that is selected for an operation.
 7. The memory device of claim6, wherein the control circuit to apply an unselected source linevoltage that is different from the selected source line voltage tounselected source lines corresponding to unselected memory cells of thearray that are not selected for the operation.
 8. The memory device ofclaim 7, wherein the unselected source line voltage is higher than theselected source line voltage.
 9. The memory device of claim 7, whereinthe unselected source line voltage is lower than a selected bit linevoltage.
 10. A method comprising: selecting a memory cell of an array ofmemory cells; applying a selected source line voltage to a selectedsource line corresponding to a selected memory cell that is selected foran operation; applying an unselected source line voltage that isdifferent from the selected source line voltage to unselected sourcelines corresponding to unselected memory cells that are not selected forthe operation; and performing the operation on the selected memory cell.11. The method of claim 10, further comprising: applying a selected wordline voltage to a selected word line corresponding to the selectedmemory cell.
 12. The method of claim 11, further comprising: applyingthe selected word line voltage to the selected word line after applyingthe unselected source line voltage to the unselected source lines. 13.The method of claim 10, wherein the unselected source line voltage ishigher than the selected source line voltage.
 14. The method of claim10, wherein the unselected source line voltage is lower than a selectedbit line voltage.
 15. The method of claim 10, wherein each memory cellin the array comprises: a select transistor, wherein a source terminalof the select transistor is coupled to a source line, and wherein a gateterminal of the select transistor is coupled to a word line; and amemory element coupled in series with the select transistor, wherein afirst end of the memory element is coupled to a drain terminal of theselect transistor, and wherein a second end of the memory element iscoupled to a bit line.
 16. The method of claim 15, wherein each memorycell in one of a plurality of columns in the array shares a first commonbit line and wherein each memory cell in one of a plurality of rows inthe array shares a first common word line and first common source line.17. A memory device, comprising: a plurality of word lines; a pluralityof source lines; a plurality of bit lines; and an array of resistivememory cells, each resistive memory cell in the array comprising: aselect transistor, wherein a source terminal of the select transistor iscoupled to one of the plurality of source lines, and wherein a gateterminal of the select transistor is coupled to one of the plurality ofword lines; and a memory element coupled in series with the selecttransistor, wherein a first end of the memory element is coupled to adrain terminal of the select transistor, and wherein a second end of thememory element is coupled to one of the plurality of bit lines.
 18. Thememory device of claim 17, wherein selected source lines of theplurality of source lines corresponding to selected resistive memorycells are to receive a selected source line voltage.
 19. The memorydevice of claim 18, wherein unselected source lines of the plurality ofsource lines corresponding to unselected resistive memory cells are toreceive an unselected source line voltage that is different from theselected source line voltage.
 20. The memory device of claim 17, whereinthe resistive memory cells of the array are arranged in a plurality ofcolumns in a first direction and a plurality of rows in a seconddirection.
 21. The memory device of claim 20, wherein each restivememory cell in one of the plurality of columns shares a first common bitline and wherein each memory cell in one of the plurality of rows sharesa first common word line and first common source line.